Method of making an isolation trench and resulting isolation trench

ABSTRACT

A method of forming and resulting isolation region, which allows for densification of an oxide layer in the isolation region. One exemplary embodiment of the method includes the steps of forming a first trench, forming an oxide layer on the bottom and sidewalls of the trench, forming nitride spacers on the lined trench, and thereafter etching the silicon beneath the first trench to form a second trench area. An oxide layer is then deposited to fill the second trench. Densificiation of the isolation region is possible because the silicon is covered with nitride, and therefore will not be oxidized. Light etches are then performed to etch the oxide and nitride spacer area in the first trench region. A conventional oxide fill process can then be implemented to complete the isolation region.

FIELD OF THE INVENTION

The present invention relates to the field of semiconductor devices and,in particular, to methods for forming trench isolation regions insemiconductor devices.

BACKGROUND OF THE INVENTION

Typically in semiconductor device applications, numerous devices arepacked into a small area of a semiconductor substrate to create anintegrated circuit. Generally, these devices need to be electricallyisolated from one another to avoid problems among the devices.Accordingly, electrical isolation is an important part of semiconductordevice design to prevent unwanted electrical coupling between adjacentcomponents and devices.

Shallow trench isolation (STI) is one conventional isolation method.Shallow trench isolation provides very good device-to-device isolation.A shallow trench isolation process generally includes the followingsteps. First, a trench is formed in a semiconductor substrate using wetor dry etching with a mask. Then, an insulating layer is deposited onthe entire surface of the semiconductor substrate to fill the trench.Finally, chemical mechanical polishing (CMP) is used to planarize theinsulating layer. The insulating layer remaining in the trench acts asan STI region for providing isolation among devices in the substrate.Additionally, a nitride and/or oxidation layer may be formed on thesidewalls and bottom of the trench before depositing the insulatinglayer.

As semiconductor devices get smaller and more complex and packingdensity increases, the width of the STI regions also decreases. Inaddition, for certain types of electronic devices, a deeper isolationtrench is desired. This leads to trench isolation regions with highaspect ratios; aspect ratio refers to the height of the trench comparedto its width (h:w). An aspect ratio of greater than or equal to about3:1 is generally considered a high aspect ratio. Even when filling anisolation trench with a high-density plasma having good fillingcapability, voids or seams may still exist in the isolation regions.These defects cause electrical isolation between the devices to bereduced. Poor isolation can lead to short circuits and can reduce thelifetime of one or more circuits formed on a substrate.

FIG. 1 illustrates a high aspect ratio isolation trench 11 formed in asemiconductor substrate 10 in accordance with the prior art. Beforeforming the isolation trench 11, other layers may be deposited over thesemiconductor substrate 10, for example, layers used to form gatestructure, including an oxide layer 12, a polysilicon layer 14, and anitride layer 16. After a trench 11 is formed, an insulating layer 20 isdeposited over the semiconductor substrate 10 to fill the trench 11. Theinsulating layer 20 can be deposited using high-density plasma chemicalvapor deposition (HPDCVD). Due to the high aspect ratio of the trench11, the HPDCVD process will leave void regions 22 in the insulatinglayer 20. This occurs because in the process of depositing theinsulating layer 20, the insulating layer 20 on the sidewalls at the topof the trench 11 grows thicker than the portion closer to the bottom ofthe trench 11. Therefore, the opening at the top of the trench 11becomes closed-off before the entire volume of the trench 11 can befilled, causing the void regions 22 which diminishes the isolationproperties of the filled trench 11.

One other problem that has been experienced during known trenchformation is that silicon and/or polysilicon becomes oxidized whenexposed to high ambient temperatures, such as when put in a furnace forsteam densification. This oxidation results in undesirable changes tothe properties of the oxidized material.

Accordingly, there is a need and desire for a method of forming shallowtrench isolation region that achieves good isolation, but minimizing thedrawbacks experienced with conventional trench isolation formation.

BRIEF SUMMARY OF THE INVENTION

The invention provides a method of forming isolation regions in asemiconductor device, which provides good isolation without sacrificingperformance of the semiconductor device, even when exposed to hightemperatures during formation of the isolation region or operation ofthe device. In one exemplary embodiment, a method includes the steps offorming a trench, forming an oxide layer on the bottom and sidewalls ofthe trench, forming nitride sidewalls in the trench, etching a deepertrench region at the bottom of the trench, forming a second oxide layer,densifying the region, and then filling the trench.

These and other features of the invention will be more apparent from thefollowing detailed description that is provided in connection with theaccompanying drawings and illustrated exemplary embodiments of theinvention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 depicts a prior art semiconductor substrate including a highaspect ratio isolation trench.

FIG. 2 is a view of a semiconductor device with a trench formed in asemiconductor substrate at a first stage of processing, in accordancewith an exemplary method of the present invention.

FIG. 3 is a view of the FIG. 2 semiconductor device at a processingstage subsequent to FIG. 2, in accordance with an exemplary embodimentof the invention.

FIG. 4 is a view of the FIG. 3 semiconductor device at a processingstage subsequent to FIG. 3, in accordance with the exemplary embodimentof the invention.

FIG. 5 is a view of the FIG. 4 semiconductor device at a processingstage subsequent to FIG. 4, in accordance with the exemplary embodimentof the invention.

FIG. 6 is a view of the FIG. 5 semiconductor device at a processingstage subsequent to FIG. 5, in accordance with the exemplary embodimentof the invention.

FIG. 7 is a view of the FIG. 6 semiconductor device at a processingstage subsequent to FIG. 6, in accordance with the exemplary embodimentof the invention.

FIG. 8 is a view of the FIG. 7 semiconductor device at a processingstage subsequent to FIG. 7, in accordance with the exemplary embodimentof the invention.

FIG. 9 is a view of the FIG. 8 semiconductor device at a processingstage subsequent to FIG. 8, in accordance with the exemplary embodimentof the invention..

FIG. 10 is a view of the structure of a memory array in a conventionalNAND type flash memory.

FIG. 11 is a block diagram of a computer system using a memory celldevice having trench isolation regions formed by the exemplary methodshown in FIGS. 2-9.

DETAILED DESCRIPTION OF THE INVENTION

In the following detailed description, reference is made to theaccompanying drawings, which form a part hereof and show by way ofillustration specific embodiments in which the invention may bepracticed. These embodiments are described in sufficient detail toenable those skilled in the art to practice the invention, and it is tobe understood that other embodiments may be utilized, and that changesmay be made without departing from the spirit and scope of the presentinvention. The progression of processing steps described is exemplary ofembodiments of the invention; however, the sequence of steps is notlimited to that set forth herein and may be changed as is known in theart, with the exception of steps necessarily occurring in a certainorder.

The present invention relates to a robust method of forming a trenchisolation region, which may be a high-aspect ratio trench isolationregion, in a semiconductor device, that provides good isolation withoutsacrificing performance of the semiconductor device, even when exposedto high temperatures during isolation region formation. Specifically,the formation of the isolation region in accordance with exemplaryembodiments of the invention allows the densification of the trenchregion in a way that does not oxidize the underlying silicon. Theresulting structure provides a more robust, high-aspect ratio isolationregion than conventional trench formation methods.

Now, with reference to the figures where like numerals designate likeelements, FIGS. 2-9 depict a method for forming a trench isolationregion. The trench isolation region is part of a semiconductor device150, which may be part of a memory array, including, but not limited toa flash memory array as shown in FIG. 10, and described below.

FIG. 2 depicts a first step in the exemplary method of forming trenchisolation regions. Unfilled trenches 108 to be used as an isolationregion are formed in a semiconductor substrate 100. The trenches 108 maybe shallower in the substrate 100, i.e., have a lower aspect ratio (lessthan 3:1), than the trench 11 illustrated in FIG. 1. Shallower trenchesare easier to fill with known HDP-CVD techniques. It should beunderstood, however, that the invention is in no way limited to thedepth or the aspect ratio of the trenches 108.

Before forming the trenches 108, various semiconductor structures 103may be formed on the surface of the substrate 100. The structures 103may be, but are not limited to, structures 103 used to form gate devicesfor transistors. Although not shown in this cross-sectional view, thestructures 103 could have source/drain regions formed on either side inthe substrate 100 to form transistors. It should be understood that themethod need not include first forming structures 103, but rather,trenches 108, 108a could be formed in the surface of the substrate 100without structures 103.

In one embodiment, the structures collectively shown as stack 103include a gate oxide 101 which is deposited on or near the upper surfaceof the substrate 100. A polysilicon 102, or other conductive layer, isformed over and in contact with the gate oxide layer 101. A nitridelayer 104 is formed over the polysilicon layer 102 and serves as aninsulating layer. A second insulating layer 106 may be formed over thenitride layer 104.

The isolation trench 108 is formed by any method known in the art thatis suitable for forming a high aspect ratio trench 108. For example, thetrench 108 may be formed by etching the substrate 100 to a depth D andhaving a width W. The resulting trench 108 has sidewalls 112 terminatingat a bottom 114. The trench 108 may be a high aspect ration trench,meaning the depth D is large in comparison to the width W of the trench108. The depth to width ration may be greater than or equal to 3:1. Thedepth, in a preferred embodiment, is within the range of about 500 toabout 1500 Angstroms.

The trenches 108 form part of an array of structures, such as a memoryarray, e.g., a flash memory array. As such, the two left-most trenches108 in FIG. 2 depict portions of the memory array while the right-mosttrench 108 a depicts a trench which isolates an active memory area inthe array from the periphery or isolates periphery devices from oneanother. As shown, the periphery trench 108 a may be wider, and deeper,having sidewalls 112 a that are farther apart than the other trenches108 in the active areas of the device 150. The periphery trench 108 amay be in the range of about 300 to about 700 Angstroms deeper than thetrenches 108 in active, non-peripheral, areas in the array. In analternative embodiment, each of the trenches 108, 108 a may be formedhaving identical dimensions.

Referring now to FIG. 3, an oxide layer 110 is formed on the sidewalls112 and bottom 114 of the isolation trenches 108, 108 a to form a trenchliner. FIG. 3 shows the resultant oxide layer 110 formed, for example,by growing an oxide layer 110 in the desired area. In a preferredembodiment, the oxide layer 110 is an it-situ steam generation growth(ISGG) oxide layer, formed using any known ISGG formation process. In analternative embodiment, the oxide layer 110 may be deposited over thedevice 150, including the trench sidewalls 112, 112 a and bottom 114,114 a and can be etched to form oxide layer 110 within the trenches 108,108 a.

Next, as shown in FIG. 4, nitride spacers 111 are formed in the trenches108, 108 a. The nitride spacers 111 can be formed using knowntechniques, including deposition and selective etching of anitride-containing material. The nitride spacers 111 form rounded edgesat the top of the sidewalls 112, 112 a of the trenches 108, 108 a, andin a preferred embodiment, are etched and removed from the bottom of thetrenches 114, 114 a. The nitride spacers 111 may have a width within therange of about 50 to about 150 Angstroms. It should be understood thatthe width of the nitride spacers 111 will depend on the width W of thetrench 108, 108 a. In addition, materials other than nitride, includingbut not limited to Al₂O₃ and HfO₂, may be used, and can be selectedaccording to the filler material and method.

As shown in FIG. 5, an etching process is next used at the bottom 114,114 a of the isolation trenches 108, 108 a, etching a second, deeper andnarrower trench region 118 into the substrate 100. The etching processalso removes part of the oxide liner layer 110 which covers the bottomof the trench 108. Any etching method known in the art may be used. Thebottom trench region 118 may go into the substrate 100 to a total depthD within the range of about 1000 to about 2000 Angstroms. This increasesthe aspect ratio for the isolation regions. In the illustratedembodiment, a bottom trench 118 a is also formed at the bottom 114 ofthe array trench regions 108 a. The periphery bottom trench 118 a may beformed to a depth that is the same, less than, or greater than the depthof the bottom trenches 118 associated with the non-peripheral trenchregions 108. In a preferred embodiment, the periphery trenches aredeeper because of etch loading effect. This improves the isolation ofthe periphery area.

Next, as shown in FIG. 6, a selective oxide layer 113 is formed in theopenings for the trench 108 and the bottom trench 118. As shown, theoxide layer 113 may be formed on the sidewalls 112 of the first trenchregions 108. For the non-array trench regions 108, the bottom trenchregion 118 may be completely filled with the oxide layer 113. For theperipheral trench regions 108 a, the bottom trench 118 a may only bepartially filled, as shown. Thus, the oxide layer 113 a may only beformed on the sidewalls of the bottom trench region 118 a. This leaves adeep opening for the peripheral trench region, which includes trench 108a and bottom trench 118 a.

In one embodiment, the oxide layer 113 is formed of a layer oftetraethyl orthosilicate (TEOS), which can be selectively deposited inthe trench regions. The TEOS oxide layer 113 may be within the range of50 to about 150 Angstroms thick on the sidewalls 112, and may be a layeras thick as the bottom trench 118 is deep.

After the oxide layer 113 is formed, a step for densification in anoxygen atmosphere or steam may be possible if desired. Furnace oxidationcan be used to densify the oxide fill in the trench without oxidizingthe silicon because nitride layer 111 serves to protect the silicon.This is one advantage of the described fill process. The semiconductordevice 150 can be heated to high temperatures, which may be greater than1000° C., without experiencing unwanted changes in the characteristicsof the device 150.

After the densification, a light wet etch back is performed to removesome of the deposited oxide 113. The etch step in accordance with oneembodiment is timed, and as shown in FIG. 7, may remove a significantamount of oxide from the bottom trench 118 a in the periphery region andfrom the sidewalls of the trenches 108, 108 a. Any known conditions forperforming a wet etch for oxide may be utilized at this step.

Thereafter, as shown in FIG. 8, a nitride wet etch is performed toremove some of the nitride spacer 111 material that resides on thesidewalls 112 of the trench regions 108, 108 a. Thus, the trenches 108,108 a have nearly the same width W as when they were initially formed(with reference to FIG. 2). The nitride wet etch may be performed underknown conditions.

After the etch steps, an oxide layer 120 is deposited over thesemiconductor substrate 100, in such a way as to fill the isolationtrenches 108, 108 a and 118 a, as shown in FIG. 9. This oxide layer 120can be formed by a high density plasma chemical vapor deposition(HDP-CVD) process in the preferred embodiment, but may alternatively bedone by any other method known in the art. The oxide layer 120 does nothave any voids or gaps (such as those present in the prior art oxidelayer) because of the benefits of having shallow upper trench regions108, 108 a, which can easily be filled with HDP-CVD. In addition,densification of fill materials in the deeper trenches is possiblebecause silicon areas are covered, and therefore, will not be oxidized.

As is known in the art, the oxide layer 120 is subsequently planarizedto complete the filling of the isolation trench 108 (and the peripheraltrench 108 a). This can be done by chemical mechanical polishing (CMP)the surface of the oxide layer 120 or by any method known in the art.

In accordance with one embodiment utilizing the invention, thesemiconductor device 150 is a memory device. The trench isolation regionformed by the method of the present invention may be incorporated toseparate adjacent memory cells 50, active areas within one memory cell,a memory cell 50 from the periphery of a memory array 80, or activeareas within the periphery of the array. The memory array 80 illustratedin FIG. 10 may be a portion of a flash memory array comprised ofnumerous flash memory cells. The invention can be used to isolate flashmemory cells in the array and the array from the peripheral logic. Theflash memory cell arrays incorporating isolation trenches 108, 108 a,may be formed in accordance with known methods, including thosedescribed in U.S. Pat. No. 6,977,842, assigned to Micron Technology,Inc., and incorporated herein by reference.

The flash memory cells 50 may be of any conventional construction.Illustrated in FIG. 10, each cell 50 has its drain region 56 connectedto the same bit line BL. Each cell 50 has its control gate 66 connectedto a respective word line WL1, WL2, WL3, WL4. Each cell 50 has itssource region 54 connected to a source voltage VS. The configuration ofthe column 80 of memory cells 50 is what is known in the art as aNOR-type configuration. It should be noted that the column 80 cancontain numerous cells 50, with each cell 50 connected to a respectiveword line, and that only four cells 50 are illustrated for claritypurposes. However, the invention is not limited to flash memory or toNOR flash memory, and it may be used with other types of memory,including NAND flash memory, or other memory arrays and devices, as wellas in any semiconductor device where isolation is required.

FIG. 11 is a block diagram of a processor system 400 utilizing a memorydevice 416, which may be a flash memory device, constructed inaccordance with the present invention. That is, the flash memory device416 has cells that contain or are separated by a trench isolation regionconstructed in accordance with the invention. The processor system 400may be a computer system, a process control system or any other systememploying a processor and associated memory. The system 400 includes acentral processing unit (CPU) 402, e.g., a microprocessor, thatcommunicates with the flash memory 416 and an I/O device 408 over a bus420. It must be noted that the bus 420 may be a series of buses andbridges commonly used in a processor system, but for conveniencepurposes only, the bus 420 has been illustrated as a single bus. Asecond I/O device 410 is illustrated, but is not necessary to practicethe invention. The processor system 400 also includes random accessmemory (RAM) device 412 and may include a read-only memory (ROM) device(not shown), and peripheral devices such as a (CD) ROM drive 406 thatalso communicate with the CPU 402 over the bus 420 as is well known inthe art.

The above description and drawings are only to be consideredillustrative of exemplary embodiments which achieve the features andadvantages of the invention. Although exemplary embodiments of thepresent invention have been described and illustrated herein, manymodifications, even substitutions of materials, can be made withoutdeparting from the spirit or scope of the invention. Accordingly, theabove description and accompanying drawings are only illustrative ofexemplary embodiments that can achieve the features and advantages ofthe present invention. It is not intended that the invention be limitedto the embodiments shown and described in detail herein. The inventionis limited only by the scope of the appended claims.

1. A method of forming a trench isolation region comprising: forming afirst trench, having sidewalls and a bottom, to a first depth in asubstrate; forming a first oxide layer on the sidewalls of the firsttrench; forming a nitride layer in the first trench at least partiallyover the first oxide layer; forming a second oxide layer in the firsttrench at least partially over the nitride layer; densifying the secondoxide layer; and filling the first trench with an insulating material.2. The method of claim 1, further including the act of forming a secondtrench at the bottom of the first trench, to a second depth in thesubstrate
 3. The method of claim 2, wherein the second oxide layer isformed in the first trench and the second trench.
 4. The method of claim3, wherein the second oxide layer comprises TEOS
 5. The method of claim3, further comprising the act of wet etching to remove at least aportion of the second oxide layer from the first trench before fillingthe first trench.
 6. The method of claim 5, further comprising the actof wet etching to remove at least a portion of the nitride layer fromthe first trench before filling the first trench.
 7. The method of claim1, wherein the act of densifying the second oxide layer is performed inone of an oxygen or steam atmosphere.
 8. The method of claim 1, whereinthe act of filling the first trench comprises filling the trench with ahigh density plasma oxide.
 9. The method of claim 8, wherein the act offilling the first trench comprises a high density plasma chemical vapordeposition of an oxide layer.
 10. The method of claim 1, furthercomprising the act of planarizing the insulating material after thefirst trench regions is filled.
 11. A method of forming isolationtrenches for a semiconductor device comprising the acts of: forming atleast one array isolation trench between two active regions of an arrayarea in the semiconductor device to a first depth in a semiconductorsubstrate; forming at least one periphery isolation trench in aperiphery area outside said array area to a second depth in thesubstrate; forming a first oxide layer in the at least one arrayisolation trench and the at least one periphery isolation trench;forming a nitride layer at least partially over the first oxide layer;forming a second oxide layer at least partially over the nitride layer;densifying the second oxide layer; and filling the at least one arrayisolation trench and the at least one periphery isolation trench with aninsulating material.
 12. The method of claim 11, further comprising theact of forming a second trench at the respective bottom of the at leastone array isolation trench and forming a second isolation trench at thebottom of the at least one periphery isolation trench.
 13. The method ofclaim 12, wherein the second isolation trenches are formed to the samedepth in the substrate.
 14. The method of claim 12, wherein the secondisolation trenches are formed to different depths in the substrate. 15.The method of claim 11, wherein the depth of the second isolation trenchformed at the bottom of the at least one periphery isolation trench isgreater than the depth of the second isolation trench formed at thebottom of the at least one array isolation trench.
 16. The method ofclaim 11, wherein the act of forming at least one array isolation trenchbetween two active regions in the array area comprises forming more thanone array isolation trench in the substrate, each array isolation trenchbeing formed between two active regions.
 17. The method of claim 12,wherein the second oxide layer is formed in the at least one peripheryisolation trench, the second isolation trench formed at the bottom ofthe at least one periphery isolation trench, the at least one arrayisolation trench, and the second isolation trench formed at the bottomof the at least one array isolation trench.
 18. The method of claim 17,wherein the second oxide layer comprises TEOS.
 19. The method of claim17, further comprising the act of wet etching to remove at least aportion of the second oxide layer after the act of densifying.
 20. Themethod of claim 19, further comprising the act of wet etching to removeat least a portion of the nitride layer after the act of wet etching toremove said portion of the second oxide layer.
 21. The method of claim11, wherein the act of densifying the second oxide layer is performed inone of an oxygen or steam atmosphere.
 22. The method of claim 11,wherein the second oxide layer comprises a high density plasma oxide.23. A method of forming a flash memory device comprising: forming activeflash memory elements on a semiconductor substrate in an array area;forming integrated circuitry connectable to receive outputs from saidflash memory elements in a periphery area of the semiconductorsubstrate; and forming at least one trench isolation region in thesemiconductor substrate by the acts of: forming a first trench to afirst depth in the substrate; forming a first oxide layer on thesidewalls of the first trench; forming a nitride layer at leastpartially over the first oxide layer; forming a second oxide layer atleast partially over the nitride layer; densifying the second oxidelayer; etching at least a portion of the nitride layer; and filling thetrench with an insulating material.
 24. The method of claim 23, furthercomprising the act of forming a second trench at a bottom of the firsttrench.
 25. The method of claim 23, wherein the act of forming the firsttrench is performed in said periphery area.
 26. The method of claim 25,further comprising the act of forming a second trench to a second depthin said substrate near at least one active memory element.
 27. Themethod of claim 26, wherein the second depth is deeper than said firstdepth.
 28. The method of claim 24, wherein the second oxide layer isformed in said first trench and said second trench; and wherein theforming at least one trench isolation region further comprises etchingat least a portion of said second oxide layer and said nitride layer;and filling the second trench with an insulating material.
 29. Themethod of claim 23, wherein etching at least one of the formed firstoxide layer and the nitride layer comprises a wet etch back to removeall of the nitride layer. 30-40. (canceled)
 41. The method of claim 2further including the act of filling the second trench with aninsulating material.
 42. The method of claim 41, wherein the insulatingmaterial is a high density plasma oxide
 43. The method of claim 41,wherein the acts of filling the first trench and second trench comprisea high density plasma chemical vapor deposition of an oxide layer.
 44. Amethod of forming an isolation trench comprising: forming a first trenchto a first depth in the substrate; forming a first oxide layer directlyon the walls of the first trench; forming a nitride layer directly on atleast part of the first oxide layer; forming a second trench at thebottom of the first trench to a second depth in the substrate; forming asecond oxide layer directly on at least part of the nitride layer in thefirst trench and in the second trench; densifying the second oxidelayer; and filling the first trench and the second trench with aninsulating material.
 45. The method of claim 44 further includingetching at least a portion of said second oxide layer and said nitridelayer before filling the first trench and the second trench with aninsulating material.
 46. The method of claim 45 further wherein etchingat least a portion of said second oxide layer and said nitride layercomprises removing all of the nitride layer.